Develop new electronic and photonic semiconductor materials using state-of-art thin-film growth and characterization facilities. This group focuses on materials for light emitting diodes such as III-V, II-VI compound semiconductor thin films, photonic crystals, silicon semiconductor technologies such as nanoscale MOSFET, nonvolatile memory devices, high-K dielectrics, and post CMOS device technologies such as graphene NEMS-CMOS hybrid devices and biomorphic devices.